Application of the Characteristic Extraction for the Detection of the Internal Micro Bulk Defects in Semiconducting Materials by Near Infrared Laser Scattering Light Distribution Analyze Technology

doi:10.3969/j.issn.1001-8891.2002.03.006

Application of the Characteristic Extraction for the Detection of the Internal Micro Bulk Defects in Semiconducting Materials by Near Infrared Laser Scattering Light Distribution Analyze Technology[J]. Infrared Technology , 2002, 24(3): 23-26. DOI: 10.3969/j.issn.1001-8891.2002.03.006

Citation:

Application of the Characteristic Extraction for the Detection of the Internal Micro Bulk Defects in Semiconducting Materials by Near Infrared Laser Scattering Light Distribution Analyze Technology[J]. Infrared Technology , 2002, 24(3): 23-26. DOI: 10.3969/j.issn.1001-8891.2002.03.006

Citation:

Application of the Characteristic Extraction for the Detection of the Internal Micro Bulk Defects in Semiconducting Materials by Near Infrared Laser Scattering Light Distribution Analyze Technology[J]. Infrared Technology , 2002, 24(3): 23-26. DOI: 10.3969/j.issn.1001-8891.2002.03.006

Application of the Characteristic Extraction for the Detection of the Internal Micro Bulk Defects in Semiconducting Materials by Near Infrared Laser Scattering Light Distribution Analyze Technology

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Application of the Characteristic Extraction for the Detection of the Internal Micro Bulk Defects in Semiconducting Materials by Near Infrared Laser Scattering Light Distribution Analyze Technology

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