ZHOU Yuan, WEI Dong, WANG Chong, YANG Yu. Calculations of the Defect Distribution in the Self-ion Implanted Si Wafer[J]. Infrared Technology , 2011, 33(7): 380-384. DOI: 10.3969/j.issn.1001-8891.2011.07.002
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Citation:
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ZHOU Yuan, WEI Dong, WANG Chong, YANG Yu. Calculations of the Defect Distribution in the Self-ion Implanted Si Wafer[J]. Infrared Technology , 2011, 33(7): 380-384. DOI: 10.3969/j.issn.1001-8891.2011.07.002
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ZHOU Yuan, WEI Dong, WANG Chong, YANG Yu. Calculations of the Defect Distribution in the Self-ion Implanted Si Wafer[J]. Infrared Technology , 2011, 33(7): 380-384. DOI: 10.3969/j.issn.1001-8891.2011.07.002
|
Citation:
|
ZHOU Yuan, WEI Dong, WANG Chong, YANG Yu. Calculations of the Defect Distribution in the Self-ion Implanted Si Wafer[J]. Infrared Technology , 2011, 33(7): 380-384. DOI: 10.3969/j.issn.1001-8891.2011.07.002
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