Preparation of a CdS Ultraviolet Detector
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Abstract
A Pt/CdS Schottky UV detector was developed and studied based on the engineering application requirements of UV/IR dual-colored detectors. Key technologies such as the chip wafer surface treatment process for CdS, preparation process of the Pt electrode, and annealing of the UV detector chip were studied. The performance of the Pt/CdS Schottky UV detector was also analyzed. The results suggested a photo response rate of more than 0.2 A/W for wavelengths of 0.3–0.5 μm and an average transmittance of more than 80% for wavelengths of 3–5 μm, which meet the engineering requirements of UV/IR dual-color detectors.
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